ASML has just officially shipped its very first High-NA EUV lithography scanner to Intel, with the sparkling new Twinscan EXE:5000 extreme ultraviolet (EUV) scanner being the first High-NA scanner ...

EUV optics, light sources, ultra-clean vacuum modules, RF power, precision mechatronics, and abatement systems each come from ...

OYAMA, Japan--(BUSINESS WIRE)--Gigaphoton Inc., a leading manufacturer of light sources used in lithography, has announced success in achieving a world record 5% conversion efficiency with 100W of ...

ASML has delivered a first-generation Twinscan EXE:5000 High-NA extreme ultraviolet (EUV) lithography scanner to Intel, seven years after Intel first ordered the machine. The High numerical aperture ...

Highly anticipated: ASML specializes in manufacturing photolithography machines used to etch computer chips out of silicon wafers. The Dutch corporation is, indeed, the most highly valued European ...

Steven Scheer: "The opening of the joint ASML-imec High NA EUV Lithography Lab in Veldhoven, the Netherlands, marked a milestone in preparing High NA EUV for adoption in mass manufacturing [1].

EUV lithography is creating a new set of challenges on the photomask side for which there currently are no simple solutions. While lithography is viewed as a single technology, EUV actually is a ...

Momentum is building for extreme ultraviolet (EUV) lithography, but there are still some major challenges to solve before this long-overdue technology can be used for mass production. EUV ...

Belgium-based semiconductor research institute Imec will present its latest achievements that enable high-numerical aperture (High-NA) extreme ultraviolet (EUV) lithography at the 2024 Advanced ...

EUV Tech (EUVT), a global leader in manufacturing at-wavelength EUV metrology equipment, is excited to announce the next generation of EUV zoneplate microscopy. The AIRES ® (Actinic Image REview ...

BILLERICA, Mass.--(BUSINESS WIRE)--Entegris, Inc. (NASDAQ: ENTG), a leader in specialty chemicals and advanced materials solutions for the microelectronics industry, today released the next generation ...

The semiconductor equipment giant ASML and electronics research center imec have opened a joint laboratory dedicated to high-numerical aperture (high-NA) extreme ultraviolet (EUV) lithography, seen by ...